Misfit dislocation interactions in low mismatch p/p+ Si

Journal of Physics D: Applied Physics

Volumn 34, Issue 10 SPEC. ISS. A, 2001, Pages

  Feichtinger, P ^a   Poust, B ^a   Goorsky, M S ^a   Oster, D ^b   Chambers, J ^b   Moreland, J ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Wacker Siltronic Corp   (United States)

^c SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; SILICON WAFERS; STRAIN; SUBSTRATES;

MISFIT STRAINS;

DISLOCATIONS (CRYSTALS);

EID: 0035926860     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/10a/326     Document Type: Article

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