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Modern Physics Letters B

Volumn 15, Issue 17-19, 2001, Pages 621-624

Poole-Frenkel electrical conduction in silicon oxynitride deposited by low pressure chemical vapour deposition

(3) Ponce Pedraza, A a Carrillo Lopez, J a Morales Acevedo, A b

a BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA (Mexico)

b DEPARTAMENTO DE FÍSICA (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; SILANE; SILICON;

CHEMICAL COMPOSITION; CONFERENCE PAPER; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENT; ELECTRIC POTENTIAL; HYPOBARISM; OXYGEN CONCENTRATION; PRESSURE; REACTION ANALYSIS; VAPOR;

EID: 0035921507 PISSN: 02179849 EISSN: None Source Type: Journal
DOI: 10.1142/S0217984901002142 Document Type: Conference Paper

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.