SiOxNy films deposited by remote plasma enhanced chemical vapor deposition using SiCl4

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2088-2093

  Sanchez, O ^a   Aguilar, M A ^b   Falcony, C ^b   Martinez Duart, J M ^a   Albella, J M ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030488205     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580085     Document Type: Article

References (14)

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