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Thin Solid Films

Volumn 401, Issue 1-2, 2001, Pages 94-101

Nanocrystalline silicon carbonitride thin films prepared by plasma beam-assisted deposition

(1) Cao, Z X a

a INSTITUTE OF PHYSICS (China)

Author keywords

Ion bombardment; Nanostructures; Plasma processing and deposition; Silicon carbonitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BOMBARDMENT; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE CO-SPUTTERING;

THIN FILMS;

EID: 0035904938 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01599-1 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.