Rugged surface polycrystalline silicon film deposition and its application in a stacked dynamic random access memory capacitor electrode

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 751-756

  Ino, M ^a   Miyano, J ^a   Kurogi, H ^a   Tamura, H ^a   Nagatomo, Y ^a   Yoshimaru, M ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000435812     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588709     Document Type: Article

References (16)

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