Strength of the electric field in apertureless near-field optical microscopy

Journal of Applied Physics

Volumn 89, Issue 10, 2001, Pages 5774-5778

  Martin, Yves C ^a   Hamann, Hendrik F ^a   Wickramasinghe, H Kumar ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035873484     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1354655     Document Type: Article

References (39)

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