Electric field intensity variation in the vicinity of a perfectly conducting conical probe: Application to near-field microscopy

Microwave and Optical Technology Letters

Volumn 18, Issue 2, 1998, Pages 120-124

  Cory, H ^a,b   Boccara, A C ^b   Rivoal, J C ^b   Lahrech, A ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b INSTITUT LANGEVIN   (France)

Author keywords

Conical probe; Electromagnetics; Near field microscopy

Indexed keywords

ELECTRIC FIELDS; ELECTROMAGNETISM; FIELD EMISSION MICROSCOPES; NUMERICAL ANALYSIS; SIMULATION;

CONICAL METALLIC PROBE; NEAR FIELD MICROSCOPY;

OPTICAL SENSORS;

EID: 0032486029     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1098-2760(19980605)18:2<120::AID-MOP10>3.0.CO;2-B     Document Type: Article

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