Rapid crystallization of silicon films using electrical-current-induced joule heating

Journal of Applied Physics

Volumn 89, Issue 10, 2001, Pages 5362-5367

  Sameshima, T ^a   Andoh, N ^a   Takahashi, H ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035873423     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1367405     Document Type: Article

References (24)

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