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Volumn 69, Issue 2, 1999, Pages 221-224
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Defect reduction and surface passivation of SiO2/Si by heat treatment with high-pressure H2O vapor
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Author keywords
[No Author keywords available]
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Indexed keywords
CHARGE CARRIERS;
CHEMICAL BONDS;
DEPOSITION;
EVAPORATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HEAT TREATMENT;
HIGH PRESSURE EFFECTS;
PASSIVATION;
SILICA;
SILICON;
DEFECT REDUCTION;
ELECTRON MINORITY CARRIERS;
HIGH PRESSURE WATER VAPOR;
INTERFACES (MATERIALS);
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EID: 0032593256
PISSN: 09478396
EISSN: None
Source Type: Journal
DOI: 10.1007/s003390050993 Document Type: Article |
Times cited : (14)
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References (15)
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