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Volumn 69, Issue 2, 1999, Pages 221-224

Defect reduction and surface passivation of SiO2/Si by heat treatment with high-pressure H2O vapor

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CHEMICAL BONDS; DEPOSITION; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; HIGH PRESSURE EFFECTS; PASSIVATION; SILICA; SILICON;

EID: 0032593256     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050993     Document Type: Article
Times cited : (14)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.