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Applied Physics Letters

Volumn 79, Issue 23, 2001, Pages 3797-3799

Degradation in metal-oxide-semiconductor structure with ultrathin gate oxide due to external compressive stress

(2) Hong, Chao Chi a Hwu, Jenn Gwo a

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035803250 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1420491 Document Type: Article

Times cited : (17)

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