The influence of filament temperature on crystallographic properties of poly-Si films prepared by the hot-wire CVD method

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 188-193

  Lee, Jeong Chul ^a   Kang, Ki Hwan ^a   Kim, Seok Ki ^a   Yoon, Kyung Hoon ^a   Song, Jinsoo ^a   Park, I Jun ^a  

^a Korea Institute of Energy Research (KIER)   (South Korea)

Author keywords

Crystallographic properties; Hot wire chemical vapor deposition (HWCVD); Polycrystalline Si

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; FILM GROWTH; GLASS; GRAIN SIZE AND SHAPE; POLYSILICON; SILICON SOLAR CELLS; SUBSTRATES; TEXTURES; THERMAL EFFECTS;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

THIN FILMS;

EID: 0035801167     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01251-2     Document Type: Conference Paper

References (17)