Fundamental considerations regarding the growth of amorphous and microcrystalline silicon and alloy films

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 173-177

  Dalal, Vikram L ^a  

^a Iowa State University of Science and Technology   (United States)

Author keywords

A (Si, Ge); Amorphous silicon; H bombardment; Microcrystalline silicon

Indexed keywords

CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; DIFFUSION; FILM GROWTH; FREE RADICALS; HYDROGEN; INERT GASES; ION BOMBARDMENT; THERMODYNAMICS;

ALLOY FILMS; MICROCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0035800981     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01255-X     Document Type: Conference Paper

References (19)