Analysis of plasma properties and deposition of amorphous silicon alloy solar cells using very high frequency glow discharge

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 115-120

  Yan, B ^a,b   Yang, J ^a   Guha, S ^a   Gallagher, A ^a  

^a United Solar Systems Corp   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GLOW DISCHARGES; ION BOMBARDMENT; IONIC CONDUCTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POSITIVE IONS; SILICON ALLOYS; SOLAR CELLS; SUBSTRATES;

IONIC CURRENT INTENSITY; PLASMA PROPERTIES; POSITIVE IONIC ENERGY DISTRIBUTIONS;

AMORPHOUS SILICON;

EID: 0033298770     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-115     Document Type: Article

References (8)

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