Remote silane plasma chemistry effects and their correlation with a-Si:H film properties

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 25-30

  Kessels, W M M ^a   Smets, A H M ^a   Korevaar, B A ^a   Adriaenssens, G J ^a,b   Van De Sanden, M C M ^a   Schram D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARRIER MOBILITY; DEPOSITION; FILM GROWTH; HYDROGENATION; PLASMAS; SOLAR CELLS;

EXPANDING THERMAL PLASMA DEPOSITION; REMOTE SILANE PLASMA CHEMISTRY EFFECTS;

SILANES;

EID: 0033297298     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-25     Document Type: Article

References (10)

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