Thin film characterization of diamond-like carbon films prepared by r.f. Plasma chemical vapor deposition

Thin Solid Films

Volumn 302, Issue 1-2, 1997, Pages 5-11

  Hirakuri, Kenji K ^a,b   Minorikawa, Takumi ^b   Friedbacher, Gernot ^a   Grasserbauer, Manfred ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Diamond like carbon film; Infrared spectroscopy; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRON ENERGY LEVELS; HARDNESS; INFRARED SPECTROSCOPY; MORPHOLOGY; PLASMA APPLICATIONS; PRESSURE EFFECTS; SURFACE ROUGHNESS; THIN FILMS;

PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0031163498     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00022-9     Document Type: Article

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