Characterization of a monolithic silicon MEMS technology in standard CMOS process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4534, Issue , 2001, Pages 79-85

  Ye, Kuntao ^a   Beyette Jr , Fred R ^a  

^a 705 Engineering Research Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DRY ETCHING; FABRICATION; MICROPROCESSOR CHIPS; SEMICONDUCTING SILICON; SUBSTRATES;

WET ETCHING;

MICROELECTROMECHANICAL DEVICES;

EID: 0035764043     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448003     Document Type: Conference Paper

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