Toward a high average power and debris free soft X-ray source for microlithography, pumped by a long pulse excimer laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3767, Issue , 1999, Pages 33-44

  Bollanti, S ^a   Di Lazzaro, P ^a   Flora, F ^a   Letardi, T ^a   Marinai, A ^a   Nottola, A ^a   Vigli Papadaki, K ^a   Vitali, A ^a   Bonfigli, F ^a   Lisi, N ^a   Palladino, L ^a   Reale, A ^a   Zheng, C E ^a  

^a ENEA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; COPPER; EXCIMER LASERS; LASER PRODUCED PLASMAS; PULSED LASER APPLICATIONS; TANTALUM; ULTRAFAST PHENOMENA; X RAY LITHOGRAPHY;

SOFT X RAY SOURCES;

X RAY PRODUCTION;

EID: 0033361283     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)