Novel condenser for EUV lithography ring-field projection optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3767, Issue , 1999, Pages 225-236

  Chapman, Henry N ^a   Nugent, Keith A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; FOCUSING; LIGHT REFLECTION; MIRRORS; RAY TRACING; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; X RAY OPTICS;

PHOTOLITHOGRAPHY;

EID: 0033358427     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)