Fabrication of diffractive optical elements on a Si chip by an imprint lithography using non-symmetrical silicon mold

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 228-237

  Hirai, Yoshihiko ^a   Okano, Masato ^b   Okuno, Hiroyuki ^a   Toyota, Hiroshi ^b   Yotsuya, Tsutomu ^a   Kikuta, Hisao ^a   Tanaka, Yoshio ^a  

^a Osaka Prefecture University   (Japan)

^b OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

Author keywords

Chirped diffraction gratings; Dry etching; Electron beam lithography; Imprint lithography; Mold; Proximity correction

Indexed keywords

ANISOTROPY; COMPUTER AIDED ANALYSIS; DIFFRACTION GRATINGS; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; MASKS; OPTIMIZATION; POLYMETHYL METHACRYLATES; SEMICONDUCTING SILICON;

IMPRINT LITHOGRAPHY;

DIFFRACTIVE OPTICS;

EID: 0035759631     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.448045     Document Type: Article

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