Fine pattern imprint lithography using dimpled mold

Journal of Photopolymer Science and Technology

Volumn 13, Issue 3, 2000, Pages 435-439

  Hirai, Yoshihiko ^a   Kanemaki, Yasuhito ^a   Fujiwara, Masaki ^a   Yotsuya, Tutomu ^b   Tanaka, Yoshio ^a  

^a Osaka Prefecture University   (Japan)

^b OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

Author keywords

Dot; Imprint lithography; Isotropic etching; Mold

Indexed keywords

ANISOTROPY; ARTICLE; COOLING; LITHOGRAPHY; MACHINE; PHYSICAL PHENOMENA; PRESSURE; SYNTHESIS; TECHNIQUE; TEMPERATURE;

EID: 0034583982     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.435     Document Type: Article

References (10)