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Volumn 8, Issue 2, 1999, Pages 152-160

Microfabrication of high-temperature silicon devices using wafer bonding and deep reactive ion etching

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; COMBUSTION; FUEL INJECTION; GAS ENGINES; HIGH TEMPERATURE OPERATIONS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OXIDATION; REACTIVE ION ETCHING; SILICON WAFERS;

EID: 0345325567     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.767111     Document Type: Article
Times cited : (77)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.