A performance evaluation of MEMS-based micronozzles

33rd Joint Propulsion Conference and Exhibit

Volumn , Issue , 1997, Pages

  Bayt, R L ^a   Ayon, A A ^a   Breuer, K S ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATTITUDE CONTROL; INDUCTIVELY COUPLED PLASMA; NAVIER STOKES EQUATIONS; NOZZLES; ORBITS; PROPULSION; REACTIVE ION ETCHING; REYNOLDS NUMBER;

DEEP REACTIVE ION ETCHING; DIFFERENT GEOMETRY; LAVAL NOZZLES; MICRO NOZZLE; NAVIER STOKES SIMULATION; NOZZLE THROAT; SMALL SPACECRAFTS; STATION-KEEPING;

NOZZLE DESIGN;

EID: 84962883022     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)

1. Janson, S. W. "The On-Orbit Role of Electric Propulsion," AIAA Paper 93-2220, June 1993.
2. Sutton, G. P. Rocket Propulsion Elements, Sixth Edition, John Wiley and Sons, New York, 1992.
3. London, A. P., "A Systems Study of Propulsion Technologies for Orbit and Attitude Control of Microspacecraft", MIT, Master's Thesis, 1996.
4. Rome, D. E., "Electron-Beam Studies of Viscous Flow in Supersonic Nozzles," AIAA Journal, Vol. 9, No. 5, 1971, pp.804-811.
5. Grisnik, S.P., Smith, T.A., Salz, L.E., "Experimental Study of Low Reynolds Number Nozzles," AIAA Paper 87-0092, May 1987.
6. Janson, S. W., and Helvajian, H., "Batch-Fabricated Microthrusters: Initial Results", AIAA Paper 96-2988, July 1996.
7. Williams, J.C., "Viscous Compressible and Incompressible Flow in Slender Channels," AIAA Journal, Vol. No.l, Jan 1963, pp. 186-195.
8. Rae, W. J., "Some Numerical Results on Viscous Low-Density Nozzle Flows in the Slender-Channel Approximation," AIAA Journal, Vol. 9, No. 5, pp. 811-820.
9. Kirn, Suk C., "Calculations of Low-Reynolds Number Resistojet Nozzles," Journal of Spacecraft and Rockets, Vol. 31, No. 2, 1994, pp. 259-264.
10. Zelesnik, D, Micci, M., Long, L., "Direct Simulation Monte Carlo Model of Low Reynolds Number Nozzle Flows," Journal of Propulsion and Power, Vol. 10, No. 4, 1994, pp 546-553.
11. Rohsenow, W. M., and Choi, Harry, Heat, Mass, and Momentum Transfer, Prentice-Hall, Inc., Englewood Cliffs, New Jersey, 1961, pp. 284-288.
12. Arkilic, E. B. "Measurement of the Mass Flow and Tangential Momentum Accommodation Coefficient in Silicon Micromachined Channels", MIT, Ph.D. Thesis, 1997.
13. Oehrlein, G. S., Rembetski, J.F., and Payne, E.H., "Study of sidewall passivation and microscopic silicon roughness phenomena in chlorine-based reactive ion etching of silicon trenches" Journal of Vacuum Science Technology, Vol 8. No. 6., November 1990, p 1199-1211.
14. Bosch, R., "Method for anisotropically etching silicon", US Patents 4855017, 4789720, Germany Patent 4241045C1.
15. Wallis, G. and Pomerantz, D. I. "Field Assisted Glass-Metal Sealing: Journal of Applied Physics, Vol 40, No. 10, September 1969 pp. 3946-3949.