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Volumn 18, Issue 5, 2001, Pages 659-661
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High-temperature characteristics of GaInNAs/GaAs single-quantum-well lasers grown by plasma-assisted molecular beam epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
GALLIUM ALLOYS;
GALLIUM NITRIDE;
INDIUM ALLOYS;
MOLECULAR BEAMS;
QUANTUM WELL LASERS;
RAPID THERMAL ANNEALING;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTOR ALLOYS;
SEMICONDUCTOR QUANTUM WELLS;
ANNEALING TIME;
CRYSTAL QUALITIES;
FULL WIDTHS AT HALF MAXIMUMS;
HIGH TEMPERATURE CHARACTERISTICS;
PEAK INTENSITY;
PEAK WAVELENGTH;
PHOTOLUMINESCENCE PEAK;
PLASMA-ASSISTED MOLECULAR BEAM EPITAXY;
SINGLE-QUANTUM-WELL LASER;
SOLID SOURCE MOLECULAR BEAM EPITAXY;
MOLECULAR BEAM EPITAXY;
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EID: 0035616812
PISSN: 0256307X
EISSN: None
Source Type: Journal
DOI: 10.1088/0256-307X/18/5/312 Document Type: Article |
Times cited : (5)
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References (12)
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