Investigation on the Corrosion of Cu Metallization in the Focused Ion Beam System Due to a low I2 Background

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 1999, Pages 135-140

  Bender, H ^a   Jin, S ^a   Vervoort, I ^a   Lantasov, Y ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COPPER; CORROSION; ELECTROPLATING; ETCHING; FAILURE ANALYSIS; ION BEAMS; METALLIZING; STRUCTURAL ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

CORROSION SENSITIVITY; FOCUSED ION BEAMS (FIB);

IODINE;

EID: 1542300944     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

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2. E.C.G. Kirk, D.A. Williams and H. Ahmed, Inst. Phys. Conf. Ser. 100, 501-6 (1989).
3. H. Bender, P. Van Marcke, C. Drijbooms and P. Roussel, in: Characterization and Metrology for ULSI Technology: 1998 International Conference, eds D.G. Seiler, A.C. Diebold, W.M. Bullis, T.J. Shaffner, R. McDonald, E.J. Walters (American Institute of Physics, Woodbury) p. 863-7 (1998).
4. H. Bender, Inst. Phys. Conf. Ser. in press (1999).