Compact synchrotron radiation lithography system for 70 nm device manufacturing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2444-2447

  Miyatake, Tsutomu ^a   Li, Xuan ^a   Hirose, Sayumi ^a   Monzen, Toshio ^a   Fujii, Kiyoshi ^b   Suzuki, Katsumi ^b  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SCATTERING; MICROTRONS; RELIABILITY; SEMICONDUCTOR DEVICE MANUFACTURE; X RAY LITHOGRAPHY;

COMPACT SYNCHROTRON RADIATION LITHOGRAPHY; SCATTERED LIGHT ALIGNMENT SYSTEM;

SYNCHROTRON RADIATION;

EID: 0035519139     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1409382     Document Type: Article

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