Performance of a compact beamline with high brightness for X-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2986-2989

  Hirose, Sayumi ^a   Miyatake, Tsutomu ^a   Li, Xuan ^a   Toyota, Eijiro ^a   Hirose, Masaoki ^a   Fujii, Kiyoshi ^b   Suzuki, Katsumi ^b  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRONS; MIRRORS; OPTIMIZATION; SYNCHROTRON RADIATION;

BEAMLINES; BRIGHTNESS;

X RAY LITHOGRAPHY;

EID: 0034316458     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319832     Document Type: Article

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