Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3471-3475

  Miyatake, Tsutomu ^a   Hirose, Masaoki ^a   Shoki, Tsutomu ^b   Ohkubo, Ryo ^b   Yamazaki, Kuniaki ^c  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b HOYA CORPORATION   (Japan)

^c MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000896057     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590479     Document Type: Article

References (5)

1. T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, Proc. SPIE 3048, 20 (1997).
2. T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, J. Vac. Sci. Technol. B 15, 2471 (1997).
3. R. I. Fuentes, C. Progler, S. Bukofsky, and K. Kimmel, J. Vac. Sci. Technol. B 10, 3204 (1992).
4. M. Reilly, Q. Leonard, G. Wells, C. Capasso, P. Anderson, J. Taylor, W. Waldo, K. Yamazaki, G. Chen, K. Simon, and F. Cerrina, Jpn. J. Appl. Phys., Part 1 33, 6899 (1994).
5. K. R. Kimmel and P. J. Hughes, Proc. SPIE 2793, 176 (1996).