Evaluation of alignment accuracy in processed wafers and SiC masks on a scattered-light alignment system for x-ray aligners

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2471-2475

  Miyatake, Tsutomu ^a   Hirose, Masaoki ^a   Shoki, Tsutomu ^b   Ohkubo, Ryo ^b   Yamazaki, Kuniaki ^c  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

^b HOYA CORPORATION   (Japan)

^c MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000314572     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589669     Document Type: Review

References (9)

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