Evaluation of ZnO substrates for homoepitaxy

Journal of Crystal Growth

Volumn 227-228, Issue , 2001, Pages 944-949

  Wenisch, H ^a   Kirchner, V ^a   Hong, S K ^a   Chen, Y F ^a   Ko, H J ^a   Yao, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

A1. Substrates; A1. Surface damage; A1. Volume defects; A1. X ray diffraction; A3. Homoepitaxy; B2. Semiconducting II VI materials

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL LATTICES; PHYSICAL VAPOR DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; X RAY CRYSTALLOGRAPHY; ZINC OXIDE;

SURFACE DAMAGE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 0035398777     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)00932-0     Document Type: Conference Paper

References (22)