Oxygen-free dry etching of α-SiC using dilute SF6:Ar in an asymmetric parallel plate 13.56 MHz discharge

Applied Physics Letters

Volumn 73, Issue 1, 1998, Pages 76-78

  Scofield, J D ^a   Bletzinger, P ^a   Ganguly, B N ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001931169     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121728     Document Type: Article

References (9)

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