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Surface Science

Volumn 480, Issue 3, 2001, Pages 188-195

Using photoelectron emission microscopy with hard-X-rays

(7) Hwu, Y a,b Tsai, W L a Lai, B c Je, J H d Fecher, G H e Bertolo, M f Margaritondo, G b

a INSTITUTE OF PHYSICS (Taiwan)

b EPFL (Switzerland)

c ARGONNE NATIONAL LABORATORY (United States)

d Pohang University of Science and Technology (POSTECH) (South Korea)

e JOHANNES GUTENBERG UNIVERSITY (Germany)

f SINCROTRONE TRIESTE (Italy)

Author keywords

Photoelectron emission; X ray absorption spectroscopy

Indexed keywords

PHOTOEMISSION; X RAY PHOTOELECTRON SPECTROSCOPY;

HARD X RAYS; X RAY ABSORPTION FINE STRUCTURE ANALYSIS;

ELECTRON MICROSCOPY;

EID: 0035365994 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)00834-2 Document Type: Article

Times cited : (14)

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