Recent progress in photoemission microscopy with emphasis on chemical and magnetic sensitivity

Journal of Electron Spectroscopy and Related Phenomena

Volumn 84, Issue 1-3, 1997, Pages 171-188

  Swiech, W ^a   Fecher, G H ^a   Ziethen, Ch ^a   Schmidt, O ^a   Schonhense G ^a   Grzelakowski, K ^b   Schneider, C M ^c   Fromter R ^c   Oepen, H P ^c   Kirschner, J ^c  

^a JOHANNES GUTENBERG UNIVERSITY   (Germany)

^b FOCUS GmbH   (Germany)

^c MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Microspectroscopy; Photoemission microscopy; Spectromicroscopy; Surface magnetism

Indexed keywords

EID: 0347877206     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0368-2048(97)00022-4     Document Type: Article

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