Neutral uniformity and transport mechanisms for plasma etching

Physics of Plasmas

Volumn 8, Issue 6, 2001, Pages 3069-3076

  Yun, Seokmin ^a,c   Kolobov, Vladimir ^b   Tynan, George R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b CFD RESEARCH CORPORATION   (United States)

^c LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035365717     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1371955     Document Type: Article

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