Spatial profiles of neutral, ion, and etch uniformity in a large-area high-density plasma reactor

Journal of Applied Physics

Volumn 89, Issue 2, 2001, Pages 911-914

  Yun, Seokmin ^a   Tynan, George R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003234125     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1335620     Document Type: Article

References (17)

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