Development of residual stress and mechanical behavior of c-BN-layers;Eigenspannungsentwicklung und mechanisches verhalten von c-bn-schichten

Vakuum in Forschung und Praxis

Volumn 13, Issue 3, 2001, Pages 161-170

  Bobeth, M ^a   Moller J ^a   Pompe, W ^a   Reiche, D ^a   Trommer, O ^a   Ullrich, A ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; BOND STRENGTH (MATERIALS); COMPUTER SIMULATION; DEFECTS; FRACTURE MECHANICS; RESIDUAL STRESSES;

ADHESION STRENGTH; LAYER DEFECTS;

CUBIC BORON NITRIDE;

EID: 0035364707     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/1522-2454(200106)13:3<161::AID-VIPR161>3.0.CO;2-I     Document Type: Article

References (16)

1. Review of advances in cubic boron nitride film synthesis
2. Crystallographic texture in cubic boron nitride thin films
3. Synthesis of cubic boron nitride thin films
4. Strain relaxation of boron nitride thin films on silicon
5. The microstructure of boron nitride thin films
6. Correlation between density and structure in boron nitride thin films by X-ray diffraction
7. Analysis of residual stress in cubic boron nitride thin films using micromachined cantilever beams
8. Microstructure and stress investigations of cubic boron nitride thin films
9. Conditions for the formation of cubic boron nitride films by r. f. magnetron sputtering
10. Critical radius for interface separation of a compressivley stressed film from a rough surface
11. Substrate effects in cubic boron nitride film formation
12. Effects of ambient on the adhesion of cubic boron nitride films on silicon substrates
13. Delamination mechanism in relation to adhesion of cubic boron nitride
14. Mechanical properties of brittle materials: Modern theories and experimental evidence
15. Deposition of well adhering cBN films up to 2μm thickness by B-C-N gradient layer system