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Volumn 16, Issue 5, 2001, Pages 1363-1371

Optimization of the annealing process for the (Ba, Sr)TiO3 thin films grown by low-temperature (420 °C) metalorganic chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; CRYSTAL IMPURITIES; CURRENT DENSITY; ELECTRODES; FILM GROWTH; LEAKAGE CURRENTS; LOW TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTIMIZATION; PERMITTIVITY; RANDOM ACCESS STORAGE; SPUTTERING;

EID: 0035352098     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2001.0191     Document Type: Article
Times cited : (9)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.