Effect on selected-phase growth of crystalline C-N films by controlling nitrogen, hydrogen and methane mixture

Journal of Materials Science Letters

Volumn 16, Issue 7, 1997, Pages 594-597

  Chen, Yan ^a,b   Guo, Liping ^a   Wang, E G ^a  

^a INSTITUTE OF PHYSICS   (China)

^b YORK UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; CHEMICAL VAPOR DEPOSITION; HYDROGEN; LATTICE CONSTANTS; METHANE; NITRIDES; NITROGEN; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

BIAS ASSISTED HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); CRYSTALLINE FILMS; ENERGY DISPERSIVE X RAY ANALYSIS (EDX); SELECTED PHASE GROWTH;

CRYSTALLINE MATERIALS;

EID: 0031123582     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1018538410356     Document Type: Article

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