High-power laser diodes with dry-etched mirror facets and integrated monitor photodiodes

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 7, Issue 2, 2001, Pages 106-110

  Deichsel, Eckard ^a,b   Eberhard, Franz ^a,c   Jäger, Roland ^a,b   Unger, Peter ^a,b  

^a IEEE   (Germany)

^b UNIVERSITY OF ULM   (Germany)

^c OSRAM OPTO SEMICONDUCTORS GMBH   (Germany)

Author keywords

Etching; Integrated optoelectronics; Semiconductor device fabrication; Semiconductor lasers

Indexed keywords

CHEMICALLY ASSISTED ION-BEAM ETCHING PROCESS; GRADED-INDEX SEPARATE-CONFINEMENT HETEROSTRUCTURE; INTEGRATED MONITOR PHOTODIODES; WALL-PLUG EFFICIENCY;

DRY ETCHING; HEAT SINKS; HETEROJUNCTIONS; HIGH POWER LASERS; INTEGRATED OPTOELECTRONICS; ION BEAMS; MIRRORS; OHMIC CONTACTS; PHOTODIODES; QUANTUM EFFICIENCY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

QUANTUM WELL LASERS;

EID: 0035263926     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/2944.954118     Document Type: Article

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