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Electrochemical and Solid-State Letters

Volumn 4, Issue 2, 2001, Pages

Enhancement of the chemical stability of hydrogenated aluminum nitride thin films by nitrogen plasma treatment

(5) Cho, Min Hee a Kang, Youn Seon a Kim, Hae Yeol a Lee, Paul S a Lee, Jai Young a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; LIGHT ABSORPTION; MAGNETRON SPUTTERING; MORPHOLOGY; PLASMA APPLICATIONS; STABILITY; SURFACE ROUGHNESS; THIN FILMS;

BONDING DENSITY; CHEMICAL STABILITY; INFRARED ABSORPTION; NITROGEN PLASMA TREATMENT; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING;

ALUMINUM NITRIDE;

EID: 0035262731 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1339241 Document Type: Article

Times cited : (7)

References (21)

1
- 0038877314
- (1997) Philos. Mag. A , vol.76 , pp. 1215
- Vermaut, P.¹ Ruterana, P.² Nouet, G.³

2
- 0031535907
- (1997) J. Vac. Sci. Technol., A , vol.15 , pp. 390
- Yong, Y.J.¹ Lee, J.Y.²

3
- 0030505093
- (1996) J. Vac. Sci. Technol., A , vol.14 , pp. 3092
- Wang, D.Y.¹ Nagahata, Y.² Masuda, M.³ Lee, Y.H.⁴

4
- 0028483868
- (1994) J. Mater. Sci. , vol.5 , pp. 221
- Lee, H.C.¹ Lee, J.Y.²

5
- 0026930318
- (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 3446
- Okano, H.¹ Takahashi, Y.² Tanaka, T.³ Shibata, K.⁴ Nakano, S.⁵

6
- 0001448492
- (1995) Appl. Phys. Lett. , vol.67 , pp. 1549
- Vispute, R.D.¹ Wu, H.² Narayan, J.³

7
- 0029323233
- (1995) Thin Solid Films , vol.261 , pp. 148
- Lee, H.C.¹ Kim, G.H.² Hong, S.K.³ Lee, K.Y.⁴ Yong, Y.J.⁵ Chun, C.H.⁶ Lee, J.Y.⁷

8
- 0023419879
- (1987) Jpn. J. Appl. Phys. , vol.26 , pp. 1555
- Hasegawa, F.¹ Takahashi, T.² Kubo, K.³ Nannichi, Y.⁴

9
- 0026867125
- (1992) Langmuir , vol.8 , pp. 1347
- Wang, X.D.¹ Hipps, K.W.² Mazur, U.³

10
- 0346561141
- (1994) Thin Solid Films , vol.251 , pp. 121
- Wang, X.D.¹ Jiang, W.² Norton, M.G.³ Hipps, K.W.⁴

11
- 0010380771
- (1996) U.S. Pat. 5,520,785
- Evans, K.L.¹ Liaw, H.M.² Lin, J.K.³

12
- 0000400999
- (1983) Phys. Rev. B , vol.28 , pp. 946
- Kobayashi, A.¹ Sankey, O.F.² Dow, J.D.³

13
- 84957274745
- (1987) J. Vac. Sci. Technol. A , vol.5 , pp. 1335
- Kainani, A.D.¹ Papathomas, K.I.²

14
- 5344279152
- (1996) J. Vac. Sci. Technol., B , vol.14 , pp. 3523
- Vartuli, C.B.¹ Pearton, S.J.² Abernathy, C.R.³ Mackenzie, J.D.⁴ Lambers, E.S.⁵ Zolper, J.C.⁶

15
- 77956413127
- (1994) J. Vac. Sci. Technol., A , vol.12 , pp. 1528
- Arbab, M.¹ Finley, J.J.²

16
- 0034272527
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3535
- Cho, M.H.¹ Kang, Y.S.² Kim, H.Y.³ Lee, P.S.⁴ Lee, J.Y.⁵

17
- 0001388985
- (1998) J. Appl. Phys. , vol.83 , pp. 5831
- Kim, J.H.¹ Chung, K.W.²

18
- 0000521772
- (1999) Appl. Phys. Lett. , vol.75 , pp. 3811
- Park, Y.¹ Lee, J.K.² Jung, I.³ Heo, S.-B.⁴ Lee, J.Y.⁵

19
- 0017959228
- (1978) J. Appl. Phys. , vol.49 , pp. 2473
- Landford, W.A.¹ Rand, M.J.²

20
- 0001705242
- (1994) Appl. Phys. Lett. , vol.64 , pp. 2724
- Javada, J.M.¹ Wilson, R.G.² Abernathy, C.R.³ Pearton, S.J.⁴

21
- 0003250876
- (1993) Appl. Phys. Lett. , vol.62 , pp. 363
- Chason, E.¹ Mayer, T.M.²

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