Effect of nitrogen plasma treatment on the characteristics of AlN thin films

Journal of the Electrochemical Society

Volumn 147, Issue 9, 2000, Pages 3535-3540

  Cho, Min Hee ^a   Kang, Youn Seon ^a   Kim, Hae Yeol ^a   Lee, Paul S ^a   Lee, Jai Young ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL BONDS; HEAT TREATMENT; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; NITROGEN; SILICON WAFERS; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE CHEMISTRY;

NITROGEN PLASMA TREATMENT (NPT); RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0034272527     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393933     Document Type: Article

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