High-resolution scanning capacitance microscopy by angle bevelling

Materials Science in Semiconductor Processing

Volumn 4, Issue 1-3, 2001, Pages 77-80

  Giannazzo, Filippo ^a   Raineri, Vito ^b   Privitera, Vittorio ^b   Priolo, Francesco ^a  

^a INFM   (Italy)

^b CNR IMETEM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; ION IMPLANTATION; MICROSCOPIC EXAMINATION; PHOSPHORUS; SEMICONDUCTING BORON; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS;

DOPANT PROFILING METHODS; SCANNING CAPACITANCE MICROSCOPY;

ULSI CIRCUITS;

EID: 0035246848     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00171-2     Document Type: Article

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