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Volumn , Issue , 1998, Pages 717-718
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Validation of two-dimensional implant and diffusion profiles using novel scanning capacitance microscope sample preparation and deconvolution techniques
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE MEASUREMENT;
CARRIER CONCENTRATION;
DATABASE SYSTEMS;
DIFFUSION IN SOLIDS;
IMAGE ANALYSIS;
MICROSCOPIC EXAMINATION;
PATTERN MATCHING;
DATABASE-DRIVEN DECONVOLUTION METHOD;
SCANNING CAPACITANCE MICROSCOPE (SCM) MEASUREMENTS;
TRANSIENT ENHANCED DIFFUSIONS (TED);
MOS DEVICES;
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EID: 0032271799
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (18)
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References (7)
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