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Journal of Materials Chemistry

Volumn 11, Issue 2, 2001, Pages 295-301

Factors affecting photosensitivity enhancement of chemically amplified photoresists by an acid amplifier

(4) Arimitsu, K a Kudo, K a Ohmori, H a Ichimura, K a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETOACETIC ACID; ACID; POLYMER;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL REACTION; DIFFUSION; FILM; PHOTOSENSITIVITY; REACTION ANALYSIS;

EID: 0035127281 PISSN: 09599428 EISSN: None Source Type: Journal
DOI: 10.1039/b007474h Document Type: Article

Times cited : (12)

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