Spatially-programmable thermal processing module for 300 mm wafer processing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4405, Issue , 2001, Pages 56-63

  Tay, A ^a   Khiang Wee Lim, ^a   Ai Poh Loh, ^a   Woei Wan Tan, ^a   Weng Khuen Ho, ^a   Huang, A ^a   Fu, J ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

300 mm wafer processing; Lithography; Photoresist processing; Temperature control

Indexed keywords

CLOSED LOOP CONTROL SYSTEMS; LITHOGRAPHY; PHOTORESISTS; PROCESS CONTROL; PROCESSING; TEMPERATURE CONTROL; THROUGHPUT; WSI CIRCUITS;

PHOTORESIST PROCESSING; WAFER PROCESSING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034839161     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.425238     Document Type: Conference Paper

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