Thermal mapping speeds DUV resist evaluation

Semiconductor International

Volumn 23, Issue 10, 2000, Pages

  Sharkey, Leo ^a   LeBlanc, Sean ^a   Keledjian, Steve ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

THERMAL EFFECTS; THERMAL VARIABLES MEASUREMENT; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 17344385830     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)