Nanocomposite resist system

Applied Physics Letters

Volumn 70, Issue 9, 1997, Pages 1110-1112

  Ishii, Tetsuyoshi ^a   Nozawa, Hiroshi ^a   Tamamura, Toshiaki ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000832656     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118500     Document Type: Article

References (6)

1. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).
2. K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, and K. Murase, J. Vac. Sci. Technol. B 13, 2170 (1995).
3. M. Kakuchi, M. Hikita, and T. Tamamura, Appl. Phys. Lett. 48, 835 (1986).
4. T. Tada and T. Kanayama, Jpn. J. Appl. Phys. 35, L63 (1996).
5. H. Ito, W. P. England, N. J. Clecak, G. Breyta, H. Lee, D. Y. Yoon, R. Sooriyakumaran, and W. D. Hinsberg, Proc. SPIE 1259, 65 (1993).
6. H. Ito, G. Breyta, R. Sooriyakumaran, and D. Hofer, J. Photopolym. Sci. Technol. 8, 505 (1995).