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Materials Research Society Symposium - Proceedings

Volumn 636, Issue , 2001, Pages

Precise characterization of resists and thin gate dielectrics in the VUV range for 157nm lithography

(5) Boher, P a Evrard, P a Piel, J P a Defranoux, C a Stehle J L a

a SOPRA (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; GATES (TRANSISTOR); LIGHT ABSORPTION; LIGHT REFLECTION; MICROELECTRONICS; PHOTORESISTS; THIN FILMS; ULTRAVIOLET RADIATION;

THIN GATE DIELECTRICS;

DIELECTRIC MATERIALS;

EID: 0034818339 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (1)

References (22)

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22
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.