Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep UV range

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 608-620

  Boher, P ^a   Piel, J P ^a   Defranoux, C ^a   Stehle, J L ^a   Hennet, L ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; ELLIPSOMETRY; LIGHT REFLECTION; ULTRAVIOLET SPECTROSCOPY; X RAYS;

SPECTROSCOPIC ELLIPSOMETRY;

PHOTORESISTS;

EID: 0030316208     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240988     Document Type: Conference Paper

References (9)

1. Antireflective coatings: Sultans of the swing curve
2. Organic ARC: Antireflective coating application within the microelectronics industry
3. Antireflective coatings - An overview
4. AF coupling of cobalt copper multilayers with small grain size