Combined characterization of group IV heterostructures and materials by spectroscopic ellipsometry and grazing X-ray reflectance

Thin Solid Films

Volumn 294, Issue 1-2, 1997, Pages 37-42

  Boher, P ^a   Stehle, J L ^a   Hennet, L ^b  

^a SOPRA   (France)

^b UNIVERSITÉ DE LORRAINE   (France)

Author keywords

Grazing X ray reflectance; SiGe; Silicon carbide; Spectroscopic ellipsometry

Indexed keywords

ELLIPSOMETRY; LASER APPLICATIONS; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM COMPOUNDS; SILICON CARBIDE; THICKNESS MEASUREMENT; X RAY ANALYSIS;

GRAZING X RAY REFLECTANCE; HETEROSTRUCTURES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0031070388     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09229-2     Document Type: Article

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