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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 361-370

Application of top surface imaging process to 157-nm lithography

(4) Satou, Isao a Watanabe, Manabu a Watanabe, Hiroyuki a Itani, Toshiro a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

Bilayer resist; F2 Lithography; SILYAL; Silylation; TSI

Indexed keywords

ASPECT RATIO; ETCHING; IMAGING TECHNIQUES; PHOTORESISTS;

SILYLATION; TOP SURFACE IMAGING (TSI) PROCESS;

NANOTECHNOLOGY;

EID: 0034769051 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.436867 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.